Boat Reactor for Low-Pressure Chemical Vapor Deposition
Application ID: 249
Chemical vapor deposition (CVD) is an important step in the process of manufacturing microchips. One common application is the deposition of silicon on wafers in low pressure reactors to obtain uniform deposition thicknesses.
This example models the coupled reaction kinetics, fluid flow, and mass transport in a low-pressure boat reactor. The simulation investigates how the silicon deposition rate and thickness varies in the reactor with operating conditions such as temperature and pressure.
This model example illustrates applications of this type that would nominally be built using the following products:
however, additional products may be required to completely define and model it. Furthermore, this example may also be defined and modeled using components from the following product combinations:
- COMSOL Multiphysics® et
- soit le Module Battery Design, Module Chemical Reaction Engineering, Module Corrosion, Module Electrochemistry, Module Electrodeposition, ou Module Fuel Cell & Electrolyzer et
- soit le Module Battery Design, Module Chemical Reaction Engineering, Module Corrosion, Module Electrochemistry, Module Electrodeposition, Module Fuel Cell & Electrolyzer, Module Microfluidics, Module Porous Media Flow, ou Module Subsurface Flow
The combination of COMSOL® products required to model your application depends on several factors and may include boundary conditions, material properties, physics interfaces, and part libraries. Particular functionality may be common to several products. To determine the right combination of products for your modeling needs, review the Grille des Spécifications and make use of a free evaluation license. The COMSOL Sales and Support teams are available for answering any questions you may have regarding this.