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Modelling a Novel Photonic Silicon On Insulator PhotoActivated Modulator
Posted 17 juin 2018, 02:59 UTC−4 2 Replies
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This device is similar to an inverted MOSFET. The only difference is that in the device , the n-type channel is separated from the p-type substrate by a Silicondioxide layer which acts as an insulator of thickness 150 nm. But i am facing trouble in simulation since there is no interaction or continuity between insulator layer and n-type channel. How to mantain the continuity of the p type and n type channel when a silicondioxide layer is placed between them?
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Dear Ananya, I think you are talking about the attached geometry of SOIPAM. You need to check various boundary condition at the interface of P-SiO2-N type of seminconductor.
With best wishes, (Subhash Arya)
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Some more information you can get from Blog of silicon photonics https://www.comsol.co.in/blogs/silicon-photonics-designing-and-prototyping-silicon-waveguides/